PVD Carbon - latest development/application for a PVD process

AKMEE Engineering visits Semicon Taiwan September 16th, 2022

PVD - Physical Vapor Deposit is a surface treatment technique that's been around for a while. Skytech developed a new variant called PVD Carbon which has ultra high temperature capability (1600-1900C) for use in semiconductor environment. I thought this has potential to use as we do use PVD to coat certain automotive race car parts...

This is the fancy expensive machine that performs the process. High end semiconductor equipment looks so high tech and fancy. I love engineering.

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